Electrical and Optical Properties of Ge𝑥Si𝟏−𝑥:H Thin Films Prepared by Thermal Evaporation Method

Thin a-Ge𝑥Si1−𝑥:H films were grown successfully by fabrication of designated ingot followed by evaporation onto glass slides. A range of growth conditions, Ge contents, dopant concentration (Al and As), and substrate temperature, were employed. Stoichiometry of the thin films composition was confirm...

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Bibliographic Details
Main Authors: A. A. J. Al-Douri, M. F. A. Alias, A. A. Alnajjar, M. N. Makadsi
Format: Article
Language:English
Published: Hindawi Limited 2010-01-01
Series:Advances in Condensed Matter Physics
Online Access:http://dx.doi.org/10.1155/2010/428739