Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography

Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography

In order to keep up with the advances in nano-fabrication, alternative, cost-efficient lithography techniques need to be implemented. Two of the most promising are nanoimprint lithography (NIL) and stencil lithography. We explore here the possibility of fabricating the stamp using stencil lithograph...

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Bibliographic Details
Main Authors: Juergen Brugger, Katrin Sidler, Cristina Martin-Olmos, Luis Guillermo Villanueva, Veronica Savu, Oscar Vazquez-Mena
Format: Article
Language:English
Published: MDPI AG 2013-10-01
Series:Micromachines
Subjects:
nanostencil lithography
nanoimprint lithography
nanowires
Online Access:http://www.mdpi.com/2072-666X/4/4/370
Description
Summary:In order to keep up with the advances in nano-fabrication, alternative, cost-efficient lithography techniques need to be implemented. Two of the most promising are nanoimprint lithography (NIL) and stencil lithography. We explore here the possibility of fabricating the stamp using stencil lithography, which has the potential for a cost reduction in some fabrication facilities. We show that the stamps reproduce the membrane aperture patterns within ±10 nm and we validate such stamps by using them to fabricate metallic nanowires down to 100 nm in size.
ISSN:2072-666X

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