Design of an Image-Servo Mask Alignment System Using Dual CCDs with an XXY Stage
Mask alignment of photolithography technology is used in many applications, such as micro electro mechanical systems’ semiconductor process, printed circuits board, and flat panel display. As the dimensions of the product are getting smaller and smaller, the automatic mask alignment of photolithogra...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2016-02-01
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| Series: | Applied Sciences |
| Subjects: | |
| Online Access: | http://www.mdpi.com/2076-3417/6/2/42 |