Mapping between two models of etching process
We consider two models for the etching processes using numerical simulations based on cellular-automata discrete-lattice approach. In the first model we use a uniform etching probability for each surface site. In the second model the etching probability at a given site depends on the local environme...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Institute for Condensed Matter Physics
2007-12-01
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| Series: | Condensed Matter Physics |
| Subjects: | |
| Online Access: | http://dx.doi.org/10.5488/CMP.10.4.579 |