Single crystalline silicon solar cells with rib structure
To improve the conversion efficiency of Si solar cells, we have developed a thin Si wafer-based solar cell that uses a rib structure. The open-circuit voltage of a solar cell is known to increase with deceasing wafer thickness if the cell is adequately passivated. However, it is not easy to handle v...
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doaj-203d3ea99e5646e7ab340466072419df2020-11-25T00:54:16ZengAIP Publishing LLCAIP Advances2158-32262017-02-0172025104025104-610.1063/1.4976721023702ADVSingle crystalline silicon solar cells with rib structureShuhei Yoshiba0Masakazu Hirai1Yusuke Abe2Makoto Konagai3Yukimi Ichikawa4FUTURE-PV Innovation, JST, 2-2-9 Machiike-dai, Koriyama, Fukushima 963-0215, JapanFUTURE-PV Innovation, JST, 2-2-9 Machiike-dai, Koriyama, Fukushima 963-0215, JapanFUTURE-PV Innovation, JST, 2-2-9 Machiike-dai, Koriyama, Fukushima 963-0215, JapanTokyo City University, 8-15-1 Todoroki Setagaya-ku, Tokyo 158-0082, JapanFUTURE-PV Innovation, JST, 2-2-9 Machiike-dai, Koriyama, Fukushima 963-0215, JapanTo improve the conversion efficiency of Si solar cells, we have developed a thin Si wafer-based solar cell that uses a rib structure. The open-circuit voltage of a solar cell is known to increase with deceasing wafer thickness if the cell is adequately passivated. However, it is not easy to handle very thin wafers because they are brittle and are subject to warpage. We fabricated a lattice-shaped rib structure on the rear side of a thin Si wafer to improve the wafer’s strength. A silicon nitride film was deposited on the Si wafer surface and patterned to form a mask to fabricate the lattice-shaped rib, and the wafer was then etched using KOH to reduce the thickness of the active area, except for the rib region. Using this structure in a Si heterojunction cell, we demonstrated that a high open-circuit voltage (VOC) could be obtained by thinning the wafer without sacrificing its strength. A wafer with thickness of 30 μm was prepared easily using this structure. We then fabricated Si heterojunction solar cells using these rib wafers, and measured their implied VOC as a function of wafer thickness. The measured values were compared with device simulation results, and we found that the measured VOC agrees well with the simulated results. To optimize the rib and cell design, we also performed device simulations using various wafer thicknesses and rib dimensions.http://dx.doi.org/10.1063/1.4976721 |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Shuhei Yoshiba Masakazu Hirai Yusuke Abe Makoto Konagai Yukimi Ichikawa |
spellingShingle |
Shuhei Yoshiba Masakazu Hirai Yusuke Abe Makoto Konagai Yukimi Ichikawa Single crystalline silicon solar cells with rib structure AIP Advances |
author_facet |
Shuhei Yoshiba Masakazu Hirai Yusuke Abe Makoto Konagai Yukimi Ichikawa |
author_sort |
Shuhei Yoshiba |
title |
Single crystalline silicon solar cells with rib structure |
title_short |
Single crystalline silicon solar cells with rib structure |
title_full |
Single crystalline silicon solar cells with rib structure |
title_fullStr |
Single crystalline silicon solar cells with rib structure |
title_full_unstemmed |
Single crystalline silicon solar cells with rib structure |
title_sort |
single crystalline silicon solar cells with rib structure |
publisher |
AIP Publishing LLC |
series |
AIP Advances |
issn |
2158-3226 |
publishDate |
2017-02-01 |
description |
To improve the conversion efficiency of Si solar cells, we have developed a thin Si wafer-based solar cell that uses a rib structure. The open-circuit voltage of a solar cell is known to increase with deceasing wafer thickness if the cell is adequately passivated. However, it is not easy to handle very thin wafers because they are brittle and are subject to warpage. We fabricated a lattice-shaped rib structure on the rear side of a thin Si wafer to improve the wafer’s strength. A silicon nitride film was deposited on the Si wafer surface and patterned to form a mask to fabricate the lattice-shaped rib, and the wafer was then etched using KOH to reduce the thickness of the active area, except for the rib region. Using this structure in a Si heterojunction cell, we demonstrated that a high open-circuit voltage (VOC) could be obtained by thinning the wafer without sacrificing its strength. A wafer with thickness of 30 μm was prepared easily using this structure. We then fabricated Si heterojunction solar cells using these rib wafers, and measured their implied VOC as a function of wafer thickness. The measured values were compared with device simulation results, and we found that the measured VOC agrees well with the simulated results. To optimize the rib and cell design, we also performed device simulations using various wafer thicknesses and rib dimensions. |
url |
http://dx.doi.org/10.1063/1.4976721 |
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