| Summary: | Cu<sub>3</sub>N/MoS<sub>2</sub> composite films were prepared by magnetron sputtering under different preparation parameter, and their photocatalytic properties were investigated. Results showed that the composite films surface was uniform and had no evident cracks. When the sputtering power of MoS<sub>2</sub> increased from 2 W to 8 W, the photocatalytic performance of the composite films showed a trend of increasing first and then decreasing. Among these films, the composite films with MoS<sub>2</sub> sputtering power of 4 W showed the best photocatalytic degradation performance. The photocatalytic degradation rate of methyl orange at 30 min was 98.3%, because the MoS<sub>2</sub> crystal in the films preferentially grew over the Cu<sub>3</sub>N crystal, thereby affecting the growth of the Cu<sub>3</sub>N crystal. The crystallinity of the copper nitride also increased. During photocatalytic degradation, the proper amount of MoS<sub>2</sub> reduced the band gap of Cu<sub>3</sub>N, and the photogenerated electron hole pairs were easily separated. Thus, the films produces additional photogenerated electrons and promotes the degradation reaction of the composite films on methyl orange solution.
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