Fabrication of p-type TiO2 and transparent p-TiO2/n-ITO p-n junctions
This study reports a transparent p-type TiO2 thin film by DC reactive magnetron sputtering method with 10% O2 partial pressure. The p-type conduction of TiO2 thin film was also confirmed by Seebeck effect. The lowest resistivity (1.458×10-2 Ω·cm) of the studied TiO2 thin film occurs at the annealing...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2019-04-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/1.5092782 |