Decoration of silicon structures by chemical deposition of nanostructured copper films on porous silicon

The results of experimental study of formation regularities, structural and optical properties of nanostructured copper films chemically deposited on porous silicon from solutions of copper sulfate and hydrofluoric acid are presented. Application of the developed solution for the copper deposition o...

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Main Authors: L. Yu. Roshchin, A. V. Bondarenko
Format: Article
Language:Russian
Published: Educational institution «Belarusian State University of Informatics and Radioelectronics» 2019-06-01
Series:Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki
Subjects:
Online Access:https://doklady.bsuir.by/jour/article/view/888
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spelling doaj-349051885de446aeb703b38beff3434f2021-07-28T16:19:54ZrusEducational institution «Belarusian State University of Informatics and Radioelectronics»Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki1729-76482019-06-01043742887Decoration of silicon structures by chemical deposition of nanostructured copper films on porous siliconL. Yu. Roshchin0A. V. Bondarenko1Belarusian state university of informatics and radioelectronicsBelarusian state university of informatics and radioelectronicsThe results of experimental study of formation regularities, structural and optical properties of nanostructured copper films chemically deposited on porous silicon from solutions of copper sulfate and hydrofluoric acid are presented. Application of the developed solution for the copper deposition on porous silicon in the decoration process of silicon structures are demonstrated.https://doklady.bsuir.by/jour/article/view/888porous siliconnanostructured copper filmschemical deposition
collection DOAJ
language Russian
format Article
sources DOAJ
author L. Yu. Roshchin
A. V. Bondarenko
spellingShingle L. Yu. Roshchin
A. V. Bondarenko
Decoration of silicon structures by chemical deposition of nanostructured copper films on porous silicon
Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki
porous silicon
nanostructured copper films
chemical deposition
author_facet L. Yu. Roshchin
A. V. Bondarenko
author_sort L. Yu. Roshchin
title Decoration of silicon structures by chemical deposition of nanostructured copper films on porous silicon
title_short Decoration of silicon structures by chemical deposition of nanostructured copper films on porous silicon
title_full Decoration of silicon structures by chemical deposition of nanostructured copper films on porous silicon
title_fullStr Decoration of silicon structures by chemical deposition of nanostructured copper films on porous silicon
title_full_unstemmed Decoration of silicon structures by chemical deposition of nanostructured copper films on porous silicon
title_sort decoration of silicon structures by chemical deposition of nanostructured copper films on porous silicon
publisher Educational institution «Belarusian State University of Informatics and Radioelectronics»
series Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki
issn 1729-7648
publishDate 2019-06-01
description The results of experimental study of formation regularities, structural and optical properties of nanostructured copper films chemically deposited on porous silicon from solutions of copper sulfate and hydrofluoric acid are presented. Application of the developed solution for the copper deposition on porous silicon in the decoration process of silicon structures are demonstrated.
topic porous silicon
nanostructured copper films
chemical deposition
url https://doklady.bsuir.by/jour/article/view/888
work_keys_str_mv AT lyuroshchin decorationofsiliconstructuresbychemicaldepositionofnanostructuredcopperfilmsonporoussilicon
AT avbondarenko decorationofsiliconstructuresbychemicaldepositionofnanostructuredcopperfilmsonporoussilicon
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