Decoration of silicon structures by chemical deposition of nanostructured copper films on porous silicon
The results of experimental study of formation regularities, structural and optical properties of nanostructured copper films chemically deposited on porous silicon from solutions of copper sulfate and hydrofluoric acid are presented. Application of the developed solution for the copper deposition o...
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Educational institution «Belarusian State University of Informatics and Radioelectronics»
2019-06-01
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Online Access: | https://doklady.bsuir.by/jour/article/view/888 |
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doaj-349051885de446aeb703b38beff3434f2021-07-28T16:19:54ZrusEducational institution «Belarusian State University of Informatics and Radioelectronics»Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki1729-76482019-06-01043742887Decoration of silicon structures by chemical deposition of nanostructured copper films on porous siliconL. Yu. Roshchin0A. V. Bondarenko1Belarusian state university of informatics and radioelectronicsBelarusian state university of informatics and radioelectronicsThe results of experimental study of formation regularities, structural and optical properties of nanostructured copper films chemically deposited on porous silicon from solutions of copper sulfate and hydrofluoric acid are presented. Application of the developed solution for the copper deposition on porous silicon in the decoration process of silicon structures are demonstrated.https://doklady.bsuir.by/jour/article/view/888porous siliconnanostructured copper filmschemical deposition |
collection |
DOAJ |
language |
Russian |
format |
Article |
sources |
DOAJ |
author |
L. Yu. Roshchin A. V. Bondarenko |
spellingShingle |
L. Yu. Roshchin A. V. Bondarenko Decoration of silicon structures by chemical deposition of nanostructured copper films on porous silicon Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki porous silicon nanostructured copper films chemical deposition |
author_facet |
L. Yu. Roshchin A. V. Bondarenko |
author_sort |
L. Yu. Roshchin |
title |
Decoration of silicon structures by chemical deposition of nanostructured copper films on porous silicon |
title_short |
Decoration of silicon structures by chemical deposition of nanostructured copper films on porous silicon |
title_full |
Decoration of silicon structures by chemical deposition of nanostructured copper films on porous silicon |
title_fullStr |
Decoration of silicon structures by chemical deposition of nanostructured copper films on porous silicon |
title_full_unstemmed |
Decoration of silicon structures by chemical deposition of nanostructured copper films on porous silicon |
title_sort |
decoration of silicon structures by chemical deposition of nanostructured copper films on porous silicon |
publisher |
Educational institution «Belarusian State University of Informatics and Radioelectronics» |
series |
Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki |
issn |
1729-7648 |
publishDate |
2019-06-01 |
description |
The results of experimental study of formation regularities, structural and optical properties of nanostructured copper films chemically deposited on porous silicon from solutions of copper sulfate and hydrofluoric acid are presented. Application of the developed solution for the copper deposition on porous silicon in the decoration process of silicon structures are demonstrated. |
topic |
porous silicon nanostructured copper films chemical deposition |
url |
https://doklady.bsuir.by/jour/article/view/888 |
work_keys_str_mv |
AT lyuroshchin decorationofsiliconstructuresbychemicaldepositionofnanostructuredcopperfilmsonporoussilicon AT avbondarenko decorationofsiliconstructuresbychemicaldepositionofnanostructuredcopperfilmsonporoussilicon |
_version_ |
1721267715287547904 |