Effects of temperature and target power on the sputter-deposition of (Ti,Zr)n+1AlCn MAX-phase thin films
Solid solution MAX phases in the Ti–Zr–Al–C system are investigated by sputter-deposition from elemental (Al, C) and alloy (Ti:Zr 50:50) targets. The effect of substrate temperature in the range 850 °C–1000 °C and different Al target-power are discussed. Lower-temperature conditions yielded films...
Main Authors: | Clio Azina, Per Eklund |
---|---|
Format: | Article |
Language: | English |
Published: |
Elsevier
2021-03-01
|
Series: | Results in Materials |
Subjects: | |
Online Access: | http://www.sciencedirect.com/science/article/pii/S2590048X20301011 |
Similar Items
-
Study on photoelectricity properties of SiCN thin films prepared by magnetron sputtering
by: Qiang Li, et al.
Published: (2021-11-01) -
Structural and Tribological Aspects on Ti (C,O,N) Magnetron Reactive Sputtered Thin-Films
by: Daniel MUNTEANU, et al.
Published: (2007-11-01) -
The properties of metal contacts on TiO2 thin films produced by reactive magnetron sputtering
by: Brus V. V., et al.
Published: (2010-10-01) -
Deposition and Characterization of Magnetron Sputtered Beta-Tungsten Thin Films
by: Liu, Jiaxing
Published: (2016) -
Review of GaN Thin Film and Nanorod Growth Using Magnetron Sputter Epitaxy
by: Aditya Prabaswara, et al.
Published: (2020-04-01)