A formation of nanostructured anodic oxide on the silicon surface
Background. In modern microelectronics, silicon remains the main material in the production of semiconductor devices and integrated microcircuits. This is largely due to the physicochemical properties of silicon oxide - SiO2, which determines a wide range of its application as an universal dielec...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
Penza State University Publishing House
2021-09-01
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| Series: | Известия высших учебных заведений. Поволжский регион: Физико-математические науки |
| Subjects: |