Surface Characterization of MoS<sub>2</sub> Atomic Layers Mechanically Exfoliated on a Si Substrate

Surface Characterization of MoS<sub>2</sub> Atomic Layers Mechanically Exfoliated on a Si Substrate

Mo disulfide overlayers with the thickness exceeding 1.77 nm were obtained on Si substrates through mechanical exfoliation. The resulting Mo disulfide flakes were then analyzed ex situ using combination of Auger electron spectroscopy (AES), elastic-peak electron spectroscopy (EPES) and scanning elec...

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Bibliographic Details
Main Authors: Mirosław Krawczyk, Marcin Pisarek, Robert Szoszkiewicz, Aleksander Jablonski
Format: Article
Language:English
Published: MDPI AG 2020-08-01
Series:Materials
Subjects:
molybdenum disulfide
Auger electron spectroscopy
scanning electron microscopy
surface composition and morphology
elastic-peak electron spectroscopy
electron inelastic mean free path
Online Access:https://www.mdpi.com/1996-1944/13/16/3595

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https://www.mdpi.com/1996-1944/13/16/3595

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