Effects of hot isostatic pressure on titanium nitride films deposited by physical vapor deposition
Films of titanium nitride deposited by physical vapor deposition on 304 L stainless steel substrates were hot isostatic pressed (HIP) under 150 MPa at 550 °C. To study the effects of this treatment on the microstructure of those films, X-ray diffraction analyses, Rutherford Backscattering spectrosco...
Main Authors: | M.J. Carbonari, J.R. Martinelli |
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Format: | Article |
Language: | English |
Published: |
Associação Brasileira de Metalurgia e Materiais (ABM); Associação Brasileira de Cerâmica (ABC); Associação Brasileira de Polímeros (ABPol)
2001-07-01
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Series: | Materials Research |
Subjects: | |
Online Access: | http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392001000300004 |
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