Network hydration, ordering and composition interplay of chemical vapor deposited amorphous silica films from tetraethyl orthosilicate

Network hydration, ordering and composition interplay of chemical vapor deposited amorphous silica films from tetraethyl orthosilicate

The chemical or mechanical performance of amorphous SiO2 films depend on intrinsic physicochemical properties, which are intimately linked to atomic and molecular arrangements in the Si–O–Si network. In this context, the present work focuses on a comprehensive description of SiO2 films deposited fro...

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Bibliographic Details
Main Authors: Babacar Diallo, Konstantina C. Topka, Maxime Puyo, Charlotte Lebesgue, Cécile Genevois, Raphael Laloo, Diane Samelor, Hélène Lecoq, Mathieu Allix, Hugues Vergnes, François Senocq, Pierre Florian, Vincent Sarou-Kanian, Thierry Sauvage, Marie-Joelle Menu, Brigitte Caussat, Viviane Turq, Constantin Vahlas, Nadia Pellerin
Format: Article
Language:English
Published: Elsevier 2021-07-01
Series:Journal of Materials Research and Technology
Subjects:
CVD
SiO2
Hydrated species
Network ordering
Etching rate
Mechanical properties
Online Access:http://www.sciencedirect.com/science/article/pii/S2238785421004117

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http://www.sciencedirect.com/science/article/pii/S2238785421004117

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