Mechanical and Magnetic Properties of Double Layered Nanostructures of Tin and Zirconium Oxides Grown by Atomic Layer Deposition
Double layered stacks of ZrO<sub>2</sub> and SnO<sub>2</sub> films, aiming at the synthesis of thin magnetic and elastic material layers, were grown by atomic layer deposition to thicknesses in the range of 20–25 nm at 300 °C from ZrCl<sub>4</sub>, SnI<sub>4...
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doaj-8c98bc7c8ce34b10b9d859fe9e00c5912021-07-23T13:57:09ZengMDPI AGNanomaterials2079-49912021-06-01111633163310.3390/nano11071633Mechanical and Magnetic Properties of Double Layered Nanostructures of Tin and Zirconium Oxides Grown by Atomic Layer DepositionAile Tamm0Helle-Mai Piirsoo1Taivo Jõgiaas2Aivar Tarre3Joosep Link4Raivo Stern5Kaupo Kukli6Institute of Physics, University of Tartu, W. Ostwaldi 1, 50411 Tartu, EstoniaInstitute of Physics, University of Tartu, W. Ostwaldi 1, 50411 Tartu, EstoniaInstitute of Physics, University of Tartu, W. Ostwaldi 1, 50411 Tartu, EstoniaInstitute of Physics, University of Tartu, W. Ostwaldi 1, 50411 Tartu, EstoniaLaboratory of Chemical Physics, National Institute of Chemical Physics and Biophysics, Akadeemia tee 23, 12618 Tallinn, EstoniaLaboratory of Chemical Physics, National Institute of Chemical Physics and Biophysics, Akadeemia tee 23, 12618 Tallinn, EstoniaInstitute of Physics, University of Tartu, W. Ostwaldi 1, 50411 Tartu, EstoniaDouble layered stacks of ZrO<sub>2</sub> and SnO<sub>2</sub> films, aiming at the synthesis of thin magnetic and elastic material layers, were grown by atomic layer deposition to thicknesses in the range of 20–25 nm at 300 °C from ZrCl<sub>4</sub>, SnI<sub>4</sub>, H<sub>2</sub>O, and O<sub>3</sub> as precursors. The as-deposited nanostructures consisted of a metastable tetragonal polymorph of ZrO<sub>2</sub>, and a stable tetragonal phase of SnO<sub>2</sub>, with complementary minor reflections from the orthorhombic polymorph of SnO<sub>2</sub>. The hardness and elastic modulus of the stacks depended on the order of the constituent oxide films, reaching 15 and 171 GPa, respectively, in the case of top SnO<sub>2</sub> layers. Nonlinear saturative magnetization could be induced in the stacks with coercive fields up to 130 Oe.https://www.mdpi.com/2079-4991/11/7/1633atomic layer depositionnanostructuresmagnetizationnanoindentationtin dioxidezirconium dioxide |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Aile Tamm Helle-Mai Piirsoo Taivo Jõgiaas Aivar Tarre Joosep Link Raivo Stern Kaupo Kukli |
spellingShingle |
Aile Tamm Helle-Mai Piirsoo Taivo Jõgiaas Aivar Tarre Joosep Link Raivo Stern Kaupo Kukli Mechanical and Magnetic Properties of Double Layered Nanostructures of Tin and Zirconium Oxides Grown by Atomic Layer Deposition Nanomaterials atomic layer deposition nanostructures magnetization nanoindentation tin dioxide zirconium dioxide |
author_facet |
Aile Tamm Helle-Mai Piirsoo Taivo Jõgiaas Aivar Tarre Joosep Link Raivo Stern Kaupo Kukli |
author_sort |
Aile Tamm |
title |
Mechanical and Magnetic Properties of Double Layered Nanostructures of Tin and Zirconium Oxides Grown by Atomic Layer Deposition |
title_short |
Mechanical and Magnetic Properties of Double Layered Nanostructures of Tin and Zirconium Oxides Grown by Atomic Layer Deposition |
title_full |
Mechanical and Magnetic Properties of Double Layered Nanostructures of Tin and Zirconium Oxides Grown by Atomic Layer Deposition |
title_fullStr |
Mechanical and Magnetic Properties of Double Layered Nanostructures of Tin and Zirconium Oxides Grown by Atomic Layer Deposition |
title_full_unstemmed |
Mechanical and Magnetic Properties of Double Layered Nanostructures of Tin and Zirconium Oxides Grown by Atomic Layer Deposition |
title_sort |
mechanical and magnetic properties of double layered nanostructures of tin and zirconium oxides grown by atomic layer deposition |
publisher |
MDPI AG |
series |
Nanomaterials |
issn |
2079-4991 |
publishDate |
2021-06-01 |
description |
Double layered stacks of ZrO<sub>2</sub> and SnO<sub>2</sub> films, aiming at the synthesis of thin magnetic and elastic material layers, were grown by atomic layer deposition to thicknesses in the range of 20–25 nm at 300 °C from ZrCl<sub>4</sub>, SnI<sub>4</sub>, H<sub>2</sub>O, and O<sub>3</sub> as precursors. The as-deposited nanostructures consisted of a metastable tetragonal polymorph of ZrO<sub>2</sub>, and a stable tetragonal phase of SnO<sub>2</sub>, with complementary minor reflections from the orthorhombic polymorph of SnO<sub>2</sub>. The hardness and elastic modulus of the stacks depended on the order of the constituent oxide films, reaching 15 and 171 GPa, respectively, in the case of top SnO<sub>2</sub> layers. Nonlinear saturative magnetization could be induced in the stacks with coercive fields up to 130 Oe. |
topic |
atomic layer deposition nanostructures magnetization nanoindentation tin dioxide zirconium dioxide |
url |
https://www.mdpi.com/2079-4991/11/7/1633 |
work_keys_str_mv |
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1721286797531545600 |