Plasma Etching Behavior of SF<sub>6</sub> Plasma Pre-Treatment Sputter-Deposited Yttrium Oxide Films
Yttrium oxyfluoride (YOF) protective materials were fabricated on sputter-deposited yttrium oxide (Y<sub>2</sub>O<sub>3</sub>) by high-density (sulfur fluoride) SF<sub>6</sub> plasma irradiation. The structures, compositions, and fluorocarbon-plasma etching behavi...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2020-06-01
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| Series: | Coatings |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2079-6412/10/7/637 |