Atomic layer deposited films of Al2O3 on fluorine-doped tin oxide electrodes: stability and barrier properties

Atomic layer deposited films of Al2O3 on fluorine-doped tin oxide electrodes: stability and barrier properties

Al2O3 layers were deposited onto electrodes by atomic layer deposition. Solubility and electron-transport blocking were tested. Films deposited onto fluorine-doped tin oxide (FTO, F:SnO2/glass) substrates blocked electron transfer to redox couples (ferricyanide/ferrocyanide) in aqueous media. Howeve...

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Bibliographic Details
Main Authors: Hana Krýsová, Michael Neumann-Spallart, Hana Tarábková, Pavel Janda, Ladislav Kavan, Josef Krýsa
Format: Article
Language:English
Published: Beilstein-Institut 2021-01-01
Series:Beilstein Journal of Nanotechnology
Subjects:
al2o3
atomic layer deposition (ald)
barrier properties
corrosion
electrochemistry
fto
Online Access:https://doi.org/10.3762/bjnano.12.2

Internet

https://doi.org/10.3762/bjnano.12.2

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