Developing a predictive model for nanoimprint lithography using artificial neural networks
Nanoimprint lithography (NIL) is a high-throughput and cost-effective technique for fabricating nanoscale features. However, the fine tuning of NIL process parameters is critical in achieving defect-free imprints. Currently, there exists no unified material and process design guidelines to deal with...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2018-12-01
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| Series: | Materials & Design |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S0264127518307597 |