Effect of ambient combinations of argon, oxygen, and hydrogen on the properties of DC magnetron sputtered indium tin oxide films

Sputtering has been well-developed industrially with singular ambient gases including neutral argon (Ar), oxygen (O2), hydrogen (H2) and nitrogen (N2) to enhance the electrical and optical performances of indium tin oxide (ITO) films. Recent preliminary investigation into the use of com...

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Bibliographic Details
Main Authors: M. Marikkannan, M. Subramanian, J. Mayandi, M. Tanemura, V. Vishnukanthan, J. M. Pearce
Format: Article
Language:English
Published: AIP Publishing LLC 2015-01-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.4906566