Numerical Investigation for the Resin Filling Behavior during Ultraviolet Nanoimprint Lithography of Subwavelength Moth-Eye Nanostructure
Accurate analysis of the resin filling process into the mold cavity is necessary for the high-precision fabrication of moth-eye nanostructure using the ultraviolet nanoimprint lithography (UV-NIL) technique. In this research, a computational fluid dynamics (CFD) simulation model was proposed to reve...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2021-07-01
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| Series: | Coatings |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2079-6412/11/7/799 |