Graphene Membrane as Suspended Mask for Lithography
Thanks to its excellent mechanical properties, graphene is particularly suited for the realization of suspended membranes. The present paper deals with one possible application of such membranes that is the realization of suspended lithographic masks for shadow evaporation onto a substrate. This tec...
Main Authors: | Giampiero Amato, Angelo Greco, Ettore Vittone |
---|---|
Format: | Article |
Language: | English |
Published: |
Hindawi Limited
2018-01-01
|
Series: | Journal of Nanomaterials |
Online Access: | http://dx.doi.org/10.1155/2018/2396593 |
Similar Items
-
One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures
by: Xianhua Tan, et al.
Published: (2018-12-01) -
In Situ Study of the Impact of Aberration-Corrected Electron-Beam Lithography on the Electronic Transport of Suspended Graphene Devices
by: Naomi Mizuno, et al.
Published: (2020-04-01) -
Highly Aligned Polymeric Nanowire Etch-Mask Lithography Enabling the Integration of Graphene Nanoribbon Transistors
by: Sangheon Jeon, et al.
Published: (2021-12-01) -
The Limit of Mask Transmission in Optical Lithography
by: Chia-Chen Wu, et al.
Published: (1999) -
Stability of suspended monolayer graphene membranes in alkaline environment
by: A. Miranda, et al.
Published: (2018-01-01)