Response surface methodology (RSM) modeling to improve removal of ciprofloxacin from aqueous solutions in photocatalytic process using copper oxide nanoparticles (CuO/UV)

Response surface methodology (RSM) modeling to improve removal of ciprofloxacin from aqueous solutions in photocatalytic process using copper oxide nanoparticles (CuO/UV)

Abstract Ciprofloxacin (CIP) antibiotic is considered as an emerging and biological resistant pollutant. This study aimed to improve of the removal of CIP from synthetic aqueous solutions in photocatalytic process through copper oxide nanoparticles as catalyst (CuO/UV). The effect of CIP concentrati...

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Bibliographic Details
Main Authors: Nahid Khoshnamvand, Ferdos Kord Mostafapour, Amir Mohammadi, Maryam Faraji
Format: Article
Language:English
Published: SpringerOpen 2018-03-01
Series:AMB Express
Subjects:
Antibiotics
Copper oxide nanoparticles
Emerging pollutants
Central composite design
Advanced oxidation processes (AOPs)
Online Access:http://link.springer.com/article/10.1186/s13568-018-0579-2

Internet

http://link.springer.com/article/10.1186/s13568-018-0579-2

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