Outliers Detection Models in Shewhart Control Charts; an Application in Photolithography: A Semiconductor Manufacturing Industry
Shewhart control charts with estimated control limits are widely used in practice. However, the estimated control limits are often affected by phase-I estimation errors. These estimation errors arise due to variation in the practitioner’s choice of sample size as well as the presence of outlying err...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2020-05-01
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| Series: | Mathematics |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2227-7390/8/5/857 |