Design and Characterization of Resist and Mold Materials for Electron-Beam and Nanoimprint Lithography

Design and Characterization of Resist and Mold Materials for Electron-Beam and Nanoimprint Lithography

Show other versions (1)

Electron beam lithography (EBL) and Nanoimprint Lithography (NIL) are the promising tools for today’s technology in terms of resolution capability, fidelity and cost of operation. Achieving highest possible resolution is a key concept for EBL where there is a huge request in applications of nanotech...

Full description

Bibliographic Details
Main Author: Con, Celal
Language:en
Published: 2011
Subjects:
Electron Beam Lithography
Resists
Nanoimprint Lithography
Mechanical Engineering
Online Access:http://hdl.handle.net/10012/6212

Internet

http://hdl.handle.net/10012/6212

Similar Items