Influences of sputtering power and oxygen percentage on the properties of R. F. magnetron sputtered ITO films and the design of antireflective coating for ITO films deposited on glass substrate

碩士 === 國立交通大學 === 電子研究所 === 83 === Indium tin oxide (ITO) were deposited onto unheated glass and polycarbonate substrates by r.f. magnetron sputtering. The properties of ITO films prepared at various r.f. powers and oxygen percentages are...

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Bibliographic Details
Main Authors:	Jen-Huan Tasi, 蔡政翰
Other Authors:	Bi-Shiou Chiou
Format:	Others
Language:	en_US
Published:	1995
Online Access:	http://ndltd.ncl.edu.tw/handle/28015502825777359884

id	ndltd-TW-083NCTU0430088
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spelling	ndltd-TW-083NCTU04300882015-10-13T12:53:37Z http://ndltd.ncl.edu.tw/handle/28015502825777359884 Influences of sputtering power and oxygen percentage on the properties of R. F. magnetron sputtered ITO films and the design of antireflective coating for ITO films deposited on glass substrate 濺鍍功率與氧分壓對射頻磁控濺鍍氧化銦錫薄膜性質的影響與在玻璃基板上抗反射鍍膜的設計 Jen-Huan Tasi 蔡政翰碩士國立交通大學電子研究所 83 Indium tin oxide (ITO) were deposited onto unheated glass and polycarbonate substrates by r.f. magnetron sputtering. The properties of ITO films prepared at various r.f. powers and oxygen percentages are investigated. It is found the refractive index of ITO film decreases with decreasing r.f. power and with increasing oxygen percentage. The refractive index of the as-deposited film ranges from 1.87 to 2.17. The feasibility of the multilayer antireflective (AR) coating design with ITO films of various refractive indices is explore in this study. Bi-Shiou Chiou 邱碧秀 1995 學位論文 ; thesis 167 en_US
collection	NDLTD
language	en_US
format	Others
sources	NDLTD
description	碩士 === 國立交通大學 === 電子研究所 === 83 === Indium tin oxide (ITO) were deposited onto unheated glass and polycarbonate substrates by r.f. magnetron sputtering. The properties of ITO films prepared at various r.f. powers and oxygen percentages are investigated. It is found the refractive index of ITO film decreases with decreasing r.f. power and with increasing oxygen percentage. The refractive index of the as-deposited film ranges from 1.87 to 2.17. The feasibility of the multilayer antireflective (AR) coating design with ITO films of various refractive indices is explore in this study.
author2	Bi-Shiou Chiou
author_facet	Bi-Shiou Chiou Jen-Huan Tasi 蔡政翰
author	Jen-Huan Tasi 蔡政翰
spellingShingle	Jen-Huan Tasi 蔡政翰 Influences of sputtering power and oxygen percentage on the properties of R. F. magnetron sputtered ITO films and the design of antireflective coating for ITO films deposited on glass substrate
author_sort	Jen-Huan Tasi
title	Influences of sputtering power and oxygen percentage on the properties of R. F. magnetron sputtered ITO films and the design of antireflective coating for ITO films deposited on glass substrate
title_short	Influences of sputtering power and oxygen percentage on the properties of R. F. magnetron sputtered ITO films and the design of antireflective coating for ITO films deposited on glass substrate
title_full	Influences of sputtering power and oxygen percentage on the properties of R. F. magnetron sputtered ITO films and the design of antireflective coating for ITO films deposited on glass substrate
title_fullStr	Influences of sputtering power and oxygen percentage on the properties of R. F. magnetron sputtered ITO films and the design of antireflective coating for ITO films deposited on glass substrate
title_full_unstemmed	Influences of sputtering power and oxygen percentage on the properties of R. F. magnetron sputtered ITO films and the design of antireflective coating for ITO films deposited on glass substrate
title_sort	influences of sputtering power and oxygen percentage on the properties of r. f. magnetron sputtered ito films and the design of antireflective coating for ito films deposited on glass substrate
publishDate	1995
url	http://ndltd.ncl.edu.tw/handle/28015502825777359884
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Influences of sputtering power and oxygen percentage on the properties of R. F. magnetron sputtered ITO films and the design of antireflective coating for ITO films deposited on glass substrate

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