A Study of Dispatching Rules for Photolithography Area in Wafer Fabrication Factories
碩士 === 國立交通大學 === 工業工程研究所 === 84 === The major objective of this research is to develop a general dispatchingmodel for the photolithography area, bottleneck area, in the wafer fabricationfactory. This research first analyzes the manufacturing process...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1996
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| Online Access: | http://ndltd.ncl.edu.tw/handle/94810580675366169192 |