Monte Carlo Simulation of Sputtering in Multicomponent Target
碩士 === 國立交通大學 === 電子研究所 === 84 === A Monte Carlo simulation program has been developed to calculate sputtering yields of multicomponent targets such as alloys, oxides and silicides. A preferential phenomenon has been studied by the effe...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1996
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/93903103356155464841 |
| Summary: | 碩士 === 國立交通大學 === 電子研究所 === 84 === A Monte Carlo simulation program has been developed to
calculate sputtering yields of multicomponent targets such as
alloys, oxides and silicides. A preferential phenomenon has
been studied by the effects of mass and bonding energy. The
main difference between this work and TRIM is the model of
surface bonding energy. In this program different component has
different bonding energy in the multicomponent targets. In TRIM
the same average surface bonding energy has been adopted for
every component of the target. So it can be explained more
easier that the component with lower surface bonding energy is
preferred sputtering. In this work Moliere, ZBL interatomic
potential and LSS electronic stopping have been adopted, the
simulated results show good agreement with the experimental
data.
|
|---|