Investigations of electromigration induced defects of Al-based interconnect

碩士 === 國立清華大學 === 材料科學(工程)研究所 === 84 ===

Bibliographic Details
Main Authors: Chen, Yi-Liang, 陳怡良
Other Authors: Hwang, Jenn-Chang
Format: Others
Language:zh-TW
Published: 1996
Online Access:http://ndltd.ncl.edu.tw/handle/00300945452851018447
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spelling ndltd-TW-084NTHU01590562016-07-13T04:10:34Z http://ndltd.ncl.edu.tw/handle/00300945452851018447 Investigations of electromigration induced defects of Al-based interconnect 鋁合金導線的電遷移缺陷結構分析 Chen, Yi-Liang 陳怡良 碩士 國立清華大學 材料科學(工程)研究所 84 Hwang, Jenn-Chang 黃振昌 1996 學位論文 ; thesis 0 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立清華大學 === 材料科學(工程)研究所 === 84 ===
author2 Hwang, Jenn-Chang
author_facet Hwang, Jenn-Chang
Chen, Yi-Liang
陳怡良
author Chen, Yi-Liang
陳怡良
spellingShingle Chen, Yi-Liang
陳怡良
Investigations of electromigration induced defects of Al-based interconnect
author_sort Chen, Yi-Liang
title Investigations of electromigration induced defects of Al-based interconnect
title_short Investigations of electromigration induced defects of Al-based interconnect
title_full Investigations of electromigration induced defects of Al-based interconnect
title_fullStr Investigations of electromigration induced defects of Al-based interconnect
title_full_unstemmed Investigations of electromigration induced defects of Al-based interconnect
title_sort investigations of electromigration induced defects of al-based interconnect
publishDate 1996
url http://ndltd.ncl.edu.tw/handle/00300945452851018447
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