Characterization of spin-on Hydrogen Silsesquioxane (HSQ) for Low dielectric constant Intermetal Dielectric Applications
碩士 === 國立交通大學 === 電子工程學系 === 85 === As the CMOS geometry shrinks to 0.35um and beyond, low dielectric constant properties become increasingly important in the selection of intermetal dielectric oxide. In this thesis, we intro...
Main Authors: | , |
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Other Authors: | |
Format: | Others |
Language: | zh-TW |
Published: |
1997
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Online Access: | http://ndltd.ncl.edu.tw/handle/41418237018331621276 |