Fabrication of Nickel Indiffusion Lithium Niobate Ridge Waveguide Modulators

• Main Authors: Hsu, Chia-Lu, 許家祿
• Other Authors: Chang, Wen-Ching
• Format: Others
• Language: zh-TW
• Published: 1997
• Online Access: http://ndltd.ncl.edu.tw/handle/60502522219672817418

碩士 === 淡江大學 === 電機工程學系 === 85 === In the paper, we study the fabrication technique of nickel-indiffusion ridge type lithium niobate waveguide. The result of experiments shows that the surface of ridge-type waveguide fabricated by the proton exchange, wet etch technique is smoother than those fabricated by dry etching. Therefore, it is suitable for the fabrication of optical waveguide device. In order to evaluate the effects of different fabrication parameters on the etching depth, we analyze those parameters in detail, including the thickness of nickel film, diffusion temperature and diffusion time. By understanding it's physical mechanism from these data. we can develop a mature fabrication process. Furthermore, we also use this technique to fabricate Y-branch, X-switch and Mach-Zehnder modulators. We successfully fabricated the buried-in type Y-branch modulator and ridge type Y-branch nodulator.