Effects of O2-Rapid Thermal Annealing and Gamma Ray Irradiation on the Microstructural Properties, Reliability, and Conduction Mechanisms of Radio-Frequency-Sputtered Ta2O5 Films
碩士 === 義守大學 === 電子工程學系 === 87 === Tantalum pentoxide films were reactively sputtered deposited on P+-type silicon substrate from a tantalum pentoxide target using Ar/O2 gas mixtures by reactive sputtering. The microstructural properties and reliability of sputtered Ta2O5 films treated by...
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| Format: | Others |
| Language: | en_US |
| Online Access: | http://ndltd.ncl.edu.tw/handle/75841299258678014449 |