The Effects of Rapid Thermal Annealing and Bottom Polysilicon Treatments on Interpoly Dielectrics
碩士 === 國立交通大學 === 電子工程系 === 87 === In this thesis, we investigate the effects of rapid post-deposition annealing (PDA) on the characteristics of TEOS deposited polyoxides ~ 11.0nm, were systematically studied with respect to PDA temperature, time, and temperature ramp rate. The results in...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1999
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| Online Access: | http://ndltd.ncl.edu.tw/handle/35400909076172197417 |