Studies on Silicon Oxide Films Deposited by Liquid Phase Deposition at Room Temperature
博士 === 國立交通大學 === 光電工程所 === 87 === In this thesis, a novel technology named liquid-phase deposition (LPD) method for fluorinated silicon dioxide formation on Si substrates at room temperature was studied. The SiO2-saturated immersing solution was prepared by dissolving silicic acid in hydrofluosilic...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Published: |
1999
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| Online Access: | http://ndltd.ncl.edu.tw/handle/91379684463938871124 |