A Nonlinear Regression Model for Exposure errors in IC Manufacturing Processes

A Nonlinear Regression Model for Exposure errors in IC Manufacturing Processes

碩士 === 國立清華大學 === 統計學研究所 === 87 ===

Bibliographic Details
Main Authors: Haw-Jyue Luo, 羅皓覺
Other Authors: Wun-Yi Shu
Format: Others
Language:zh-TW
Published: 1999
Online Access:http://ndltd.ncl.edu.tw/handle/87839629011323846057
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spelling ndltd-TW-087NTHU03370032016-06-13T04:16:03Z http://ndltd.ncl.edu.tw/handle/87839629011323846057 A Nonlinear Regression Model for Exposure errors in IC Manufacturing Processes IC製程裡曝光誤差的非線性迴歸模式 Haw-Jyue Luo 羅皓覺 碩士 國立清華大學 統計學研究所 87 Wun-Yi Shu 許文郁 1999 學位論文 ; thesis 44 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立清華大學 === 統計學研究所 === 87 ===
author2 Wun-Yi Shu
author_facet Wun-Yi Shu
Haw-Jyue Luo
羅皓覺
author Haw-Jyue Luo
羅皓覺
spellingShingle Haw-Jyue Luo
羅皓覺
A Nonlinear Regression Model for Exposure errors in IC Manufacturing Processes
author_sort Haw-Jyue Luo
title A Nonlinear Regression Model for Exposure errors in IC Manufacturing Processes
title_short A Nonlinear Regression Model for Exposure errors in IC Manufacturing Processes
title_full A Nonlinear Regression Model for Exposure errors in IC Manufacturing Processes
title_fullStr A Nonlinear Regression Model for Exposure errors in IC Manufacturing Processes
title_full_unstemmed A Nonlinear Regression Model for Exposure errors in IC Manufacturing Processes
title_sort nonlinear regression model for exposure errors in ic manufacturing processes
publishDate 1999
url http://ndltd.ncl.edu.tw/handle/87839629011323846057
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AT hawjyueluo nonlinearregressionmodelforexposureerrorsinicmanufacturingprocesses
AT luóhàojué nonlinearregressionmodelforexposureerrorsinicmanufacturingprocesses
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