Analysis of the Visualized Temperature and Flow Field in an MOCVD Furnace

• Main Authors: Hsu Chun-Yuan, 許峻源
• Other Authors: 林宜弘
• Format: Others
• Language: zh-TW
• Published: 2000
• Online Access: http://ndltd.ncl.edu.tw/handle/40231344852788504554

碩士 === 國立屏東科技大學 === 機械工程系 === 88 === The flow pattern in a MOCVD reactor is simulated using a low-speed, high temperature (hot plate) wind tunnel. A camera is used to take the flow pattern of testing section. Transverse rolls are found in this simulated horizontal MOCVD reactor. A vortex is observed in the wind tunnel, which may affect the uniformity of the film thickness deposited on the wafer (hot plate). The transverse roll observed in the horizontal MOCVD, which appears in the leading edge of the susceptor. This transverse roll is believed to increase the uniformity of the film thickness since it increases the gas resident time. The effect of various susceptor temperature on this vortex flow phenomenon is investigated. The influence of various the tilted angle of the susceptor and the force convection are also studied. All the results indicate that the experiment approach of this study is reliable and can be used extensively for the purpose of reactor design.