| Summary: | 碩士 === 義守大學 === 材料科學與工程學系 === 89 === The influence of alloying and processing on the microstructure and magnetic behavior of amorphous Co-Fe-Zr-B, prepared by sputtering deposition and subsequent annealing under an applied magnetic field, has be studied. The as-deposited film is found to be amorphous by XRD, which exhibits a coercivity of 61 Oe. It is surprised that this film does not show an anisotropic magnetization behavior, which is believed to be due to the rotation of substrate.
The films with Al up to 25 % also have amorphous structure. The magnetization behavior is still isotropic, whereas the coercivity of films decreases as the Al content increases. Such dependence of coercivity on Al alloying is ascribed to the possible changes in microstructure and stress state. It is also found that the Co-Fe-Zr-B-Al films have an amorphous structure when deposited in an atmosphere of Ar/O2. The film, deposited in a Ar/O2 plasma with O2 more than 3.2% (in volumn), does not show a hysteresis magnetic behavior. When deposited in a Ar/O2 plasma with O2 less than 0.7 %, the films exhibit a hysteresis loop.
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