Influence of pulsed plasma on properties of DLC thin films

碩士 === 國立中興大學 === 材料工程學研究所 === 89 === Abstract Application of steady direct current (DC)power to reactive sputtering of dielectrics such as Al2O3 and Diamond-like carbon(DLC)is seriously hampered by arcing. In the deposition processing, insulated layers charge up until breakdown occurs in...

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Bibliographic Details
Main Authors: Hsieh Yen-Chang, 謝炎璋
Other Authors: Da-Yung Wang
Format: Others
Language:en_US
Published: 2001
Online Access:http://ndltd.ncl.edu.tw/handle/75813616618671098521