Fabrication and Characteristic of GHz range Film Type Bulk Acoustic Wave Resonators(FBAR)
碩士 === 國立成功大學 === 電機工程學系碩博士班 === 90 === Abstract This paper reports on a film type bulk acoustic wave resonator (FBAR) fabricated by lithography, dry etching and RF magnetron sputtering of aluminum nitride (AlN)films. The acoustic cavity is made by inductively coupled plasma (ICP) etched. The bo...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/9dc587 |