Investigation of GaAs-based wet etching process in phosphoric-acid and citric-acid based solutions
碩士 === 國立清華大學 === 材料科學工程學系 === 90 === Wet etching has been widely used in mesa etch and gate recess process in GaAs device process. We prefer to use wet etching when low damage is required since dry etching always accompanies with damage. In this thesis, two etchant systems wer...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/25167762306349564419 |