Study of Electromigration of Sputtered Ti, TiN and Al-Alloy in IC Metallization

碩士 === 國立清華大學 === 工程與系統科學系 === 90 === This research focused on (1) the effect of substrate (oxide) on the preferred orientation of Ti , and the relationship of orientation among Ti , TiN and Al films, (2) the effect of processing parameter on the Al film properties and electromigration pe...

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Bibliographic Details
Main Authors: Stella S.S.Chiang, 蔣星星
Other Authors: Ge-Ping Yu
Format: Others
Language:en_US
Published: 2002
Online Access:http://ndltd.ncl.edu.tw/handle/46805646818839192399