Chemical Vapor Deposition of Si-C-O-F Low-k Dielectric Films
碩士 === 國立臺灣科技大學 === 工程技術研究所材料科技學程 === 90 === The emphasis of this study is placed on growth parameters of Si-C-O-F films synthesized by two different kinds of CVD systems using the mixture of TEOS/TDF-TEOS precursors. Water just can slightly reduce Si-C-O-F films growth temperature (about...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/01219004822886024136 |