A Study on Process Related Reliabilities of CMOS Transistors with Ultra-Thin Gate Dielectrics
博士 === 國立交通大學 === 電子工程系 === 91 === The reliability of gate dielectric has been an important issue for ultra large scale integrated (ULSI) circuits, especially as the aggressive downscaling of CMOS technology continues. In this dissertation, we have investigated reliability issues regardin...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2003
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| Online Access: | http://ndltd.ncl.edu.tw/handle/70535268049901942614 |