Study of bottom antireflective coating layers for deep sub-micron generation lithography and selective growth of nanoparticles

• Main Authors: Chien-I Kuo, 郭建億
• Other Authors: Tieh-Chi Chu
• Format: Others
• Language: zh-TW
• Published: 2003
• Online Access: http://ndltd.ncl.edu.tw/handle/55035768881290313432

碩士 === 國立清華大學 === 原子科學系 === 91 === In this thesis, our study contains two parts. First, low dielectric constant silicon carbide films were deposited by inductively coupled plasma to make a bottom antireflective coating layers for vacuum and deep ultraviolet lithographies. We can reduce the reflection from substrate dramatically after adding thin films. In addition, this BARC can be used for various highly reflective substrates such as Al, Cu, TaN, poly-Si, Pt, and W. This BARC film will not degrade chemical amplified photoresist because of no alkaline gas desorption during the post exposure bake procedure. This BARC was also modified the surface to form gradient absorption optical film by oxygen plasma treatment. The second part, we study that different substrates influence gold nanoparticles deposition and combine with optical lithography to form pattern. We find that gold nanoparticles deposition has something to do with roughness of topography. And the density of gold nanoparticles relates to oxygen composition of substrates. Besides, by using UV-vis spectrometer the peaks of surface plasmon resonance don’t shift after rinsing alcohol but sulfuric acid shift. Therefore, we can pattern high uniform, high density and good quality gold nanoparticles rapidly by virtue of conventional optical lithography.