Two-Step Growth of MOCVD Copper Using the mixture of ethanol alcohol and water as the additive

• Main Authors: Chia-Wie Chen, 陳家偉
• Other Authors: Chia pyng Lee
• Format: Others
• Language: zh-TW
• Published: 2003
• Online Access: http://ndltd.ncl.edu.tw/handle/85463140612554993861

碩士 === 國立臺灣科技大學 === 化學工程系 === 91 === The purpose of this thesis is to investigate the two-step growth of MOCVD copper using thin films the mixture of ethanol alcohol and water as the additive. In the first step , we deposited Cu2O films with the mixture of ethanol alcohol and water as the additive at 275℃.In the second step, the Cu2O films were reduced to metallic copper by ethanol alcohol as the reducing agent at the same temperature. A highly dense, conformal, and continuous Cu thin film can be deposited for Cu seed layer application. The effect of temperature on Cu2O films was that the amount of Cu atoms increased with the temperature. The grain size of Cu thin film after reduction also increased with the temperature. The optimum temperature was 275℃ for the deposition of copper thin films for 3 min,and then the grain size was 350 Å .In addition, we observed that the grain size increased with time and the best resistivity is 3.99 µΩ-cm . To deposit highly dense、continuous and pure copper films, a muti-layer two- step growth method was performed on the TaN substrate at 250℃ .