Construction of Dispatching Rule of Bottleneck Workstation under Considering on-Line Rework Strategy

• Main Author: 陳慶宏
• Other Authors: 沙永傑
• Format: Others
• Language: zh-TW
• Published: 2004
• Online Access: http://ndltd.ncl.edu.tw/handle/21015337800899983646

碩士 === 國立交通大學 === 工業工程與管理系所 === 92 === In general, wafer fabrication factories mostly define the photolithography area as the dispatching center of the whole factory. To establish a set of operative dispatching rule in the photolithography area and considering the rework of defective products would be contributive to coordinate and balance the workload in the whole production line. Furthermore, it would help to enhance the productivity and efficiency of wafer fabrication, reduce the stock of on-line WIP and shorten the production cycle time, and satisfy the requirements of customers about the production due time and the product quality. This research uses on-line rework as the basis to bring the rework of batch process factor into the dispatching rule for measurement, then develops the dispatching rule which includes the rework strategy. Besides, this research focuses on the high finished proportion of batch in the photolithography area in order to finish the manufacturing procedure faster, lighten the machine workload of the waiting line, and finally increase the quantity of output.