Dynamic Tuning of Chemical-Mechanical Planarization Operation via Sliding-Mode Theory
碩士 === 國立交通大學 === 機械工程系所 === 92 === The development of chemical mechanical planarization (CMP) to date relies on multi-stage polishing for better performance. The straight relationship between performance and operation provides a new method for control of CMP process. The strategy of dynamic tuning...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/52373673213255490614 |