Study of Forming Si/Ge Quantum dots for Single-Electron Devices
碩士 === 國立中央大學 === 電機工程研究所 === 92 === In this thesis, the technique of forming Si & Ge quantum dots for Single-electron devices will be proposed. The advantages of the technique are well controllable, reproducible and compatible with traditional CMOS process.
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ndltd-TW-092NCU054420762015-10-13T13:04:43Z http://ndltd.ncl.edu.tw/handle/17073552506973351786 Study of Forming Si/Ge Quantum dots for Single-Electron Devices 應用於單電子電晶體之矽/鍺量子點研製 Shang-Wei Lin 林上偉 碩士 國立中央大學 電機工程研究所 92 In this thesis, the technique of forming Si & Ge quantum dots for Single-electron devices will be proposed. The advantages of the technique are well controllable, reproducible and compatible with traditional CMOS process. Pei-Wen Li 李佩雯 2004 學位論文 ; thesis 89 zh-TW |
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碩士 === 國立中央大學 === 電機工程研究所 === 92 === In this thesis, the technique of forming Si & Ge quantum dots for Single-electron devices will be proposed. The advantages of the technique are well controllable, reproducible and compatible with traditional CMOS process.
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Pei-Wen Li |
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Pei-Wen Li Shang-Wei Lin 林上偉 |
author |
Shang-Wei Lin 林上偉 |
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Shang-Wei Lin 林上偉 Study of Forming Si/Ge Quantum dots for Single-Electron Devices |
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Shang-Wei Lin |
title |
Study of Forming Si/Ge Quantum dots for Single-Electron Devices |
title_short |
Study of Forming Si/Ge Quantum dots for Single-Electron Devices |
title_full |
Study of Forming Si/Ge Quantum dots for Single-Electron Devices |
title_fullStr |
Study of Forming Si/Ge Quantum dots for Single-Electron Devices |
title_full_unstemmed |
Study of Forming Si/Ge Quantum dots for Single-Electron Devices |
title_sort |
study of forming si/ge quantum dots for single-electron devices |
publishDate |
2004 |
url |
http://ndltd.ncl.edu.tw/handle/17073552506973351786 |
work_keys_str_mv |
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