Fabrication of Bismuth Titanate Ferroelectricity Thin Films by R.F. Magnetron Sputtering Method on Different Substrates
碩士 === 和春技術學院 === 電機工程研究所 === 92 === ABSTRACT In this study, the R.F. magnetron sputtering at room temperature , rapid thermal annealing (RTA) , Bi4Ti3O12+4wt%Bi2O3 and Bi4Ti3O12 as source target were used to deposit Bi4Ti3O12 thin films on the ITO/Glass substrate and the Pt/Ti/Si substrates. The...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2005
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/52188263692890430978 |