The study of ion-current-density distribution of end-Hall type ion source operated by changing shape of anode and the distance between cathode and anode

碩士 === 輔仁大學 === 物理學系 === 93 === Ion sources play important roles in the process of thin film formation. It not only can use in assistant-depesition but also in etching ,so it has been used widely for a long time in industrial . Users develop other different type of Ion source by their asks and they...

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Main Authors: Chin-Ching Chen, 陳錦慶
Other Authors: Jin-Cherng Hsu
Format: Others
Language:zh-TW
Published: 2005
Online Access:http://ndltd.ncl.edu.tw/handle/63051873697416446704
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spelling ndltd-TW-093FJU001980142015-10-13T11:39:46Z http://ndltd.ncl.edu.tw/handle/63051873697416446704 The study of ion-current-density distribution of end-Hall type ion source operated by changing shape of anode and the distance between cathode and anode 改變陽極形狀與陰極陽極間距對end-Hall離子源離子電流密度之研究 Chin-Ching Chen 陳錦慶 碩士 輔仁大學 物理學系 93 Ion sources play important roles in the process of thin film formation. It not only can use in assistant-depesition but also in etching ,so it has been used widely for a long time in industrial . Users develop other different type of Ion source by their asks and they have different operation principle in according to the needs they want. This chapter is description of broad-beam gridless end-Hall type ion source .This experiment will estimate ion current density after changing two different shape of anode and changing the distance between cathode and anode by faraday cup. The chapter are also descriptions of end-Hall type ion source , their background ,operation principle and operation conditions information. Jin-Cherng Hsu 徐進成 2005 學位論文 ; thesis 61 zh-TW
collection NDLTD
language zh-TW
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description 碩士 === 輔仁大學 === 物理學系 === 93 === Ion sources play important roles in the process of thin film formation. It not only can use in assistant-depesition but also in etching ,so it has been used widely for a long time in industrial . Users develop other different type of Ion source by their asks and they have different operation principle in according to the needs they want. This chapter is description of broad-beam gridless end-Hall type ion source .This experiment will estimate ion current density after changing two different shape of anode and changing the distance between cathode and anode by faraday cup. The chapter are also descriptions of end-Hall type ion source , their background ,operation principle and operation conditions information.
author2 Jin-Cherng Hsu
author_facet Jin-Cherng Hsu
Chin-Ching Chen
陳錦慶
author Chin-Ching Chen
陳錦慶
spellingShingle Chin-Ching Chen
陳錦慶
The study of ion-current-density distribution of end-Hall type ion source operated by changing shape of anode and the distance between cathode and anode
author_sort Chin-Ching Chen
title The study of ion-current-density distribution of end-Hall type ion source operated by changing shape of anode and the distance between cathode and anode
title_short The study of ion-current-density distribution of end-Hall type ion source operated by changing shape of anode and the distance between cathode and anode
title_full The study of ion-current-density distribution of end-Hall type ion source operated by changing shape of anode and the distance between cathode and anode
title_fullStr The study of ion-current-density distribution of end-Hall type ion source operated by changing shape of anode and the distance between cathode and anode
title_full_unstemmed The study of ion-current-density distribution of end-Hall type ion source operated by changing shape of anode and the distance between cathode and anode
title_sort study of ion-current-density distribution of end-hall type ion source operated by changing shape of anode and the distance between cathode and anode
publishDate 2005
url http://ndltd.ncl.edu.tw/handle/63051873697416446704
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