Reactivity Research of Hydrogen Peroxide and Copper Ions at Electrochemical Plating Process

碩士 === 崑山科技大學 === 環境工程研究所 === 93 === The usage of hydrogen peroxide and copper ions were increased with the mass production of the copper integration process for improving the devices performance in semiconductor industry. The compatibility of hydrogen peroxide and copper ions at electrochemical pla...

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Main Authors: WangCheng-Shyan, 王承賢
Other Authors: Kuen-Chyr Lee
Format: Others
Published: 2005
Online Access:http://ndltd.ncl.edu.tw/handle/31890527877610112312
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spelling ndltd-TW-093KSUT55150022015-10-13T11:15:48Z http://ndltd.ncl.edu.tw/handle/31890527877610112312 Reactivity Research of Hydrogen Peroxide and Copper Ions at Electrochemical Plating Process 雙氧水與銅離子於電化學電鍍製程應用之反應性研究 WangCheng-Shyan 王承賢 碩士 崑山科技大學 環境工程研究所 93 The usage of hydrogen peroxide and copper ions were increased with the mass production of the copper integration process for improving the devices performance in semiconductor industry. The compatibility of hydrogen peroxide and copper ions at electrochemical plating process was studied under various concentrations of copper ions, hydrogen peroxide, sulfate ions, chloride ions, additives and solution pH values. The root causes of explosion of waste ECP chemicals drum tank were identified by integration of this research results, process recipes and hardware configuration. Experimental results demonstrated that the heat generation rate was decreased in more acidic solution conditions which repressed the generation of Cu2+(HO2-) ions at CuSO4/H2O2 system. The concentrations of Cu2+(HO2-) ion could be enhanced by the addition of chloride ions. And cuprous ions might not just react with hydroxyl free radical but partly react with hydrogen peroxide to generate heat source which resulted from hydroxyl free radical was partly scavenged by chloride ions. Consequently, the TMR (Time to Maximum Rate) was found to be decreased significantly with increasing chloride ion concentrations at CuSO4/H2O2/Chloride system. The heat generation rate in lower concentration of citrate ions was larger than that without the chelating agent additions. These might be because hydroxyl free radical was scavenged by organic species like as citrate ions, and then changed the parts of reaction ways of cuprous ion at CuSO4/H2O2/citrate system. The TMR at CuSO4/H2O2/citrate system was lower than that at CuSO4/H2O2/EDTA system due to copper-EDTA complex ion with higher stability constant to reduce the concentrations of Cu2+(HO2-) ions. The behaviors of heat generation could be explained by introducing the concepts of species distribution and free radical reaction mechanisms in aqueous solution at CuSO4/H2O2/additive system. Kuen-Chyr Lee 李崑池 2005 學位論文 ; thesis 96
collection NDLTD
format Others
sources NDLTD
description 碩士 === 崑山科技大學 === 環境工程研究所 === 93 === The usage of hydrogen peroxide and copper ions were increased with the mass production of the copper integration process for improving the devices performance in semiconductor industry. The compatibility of hydrogen peroxide and copper ions at electrochemical plating process was studied under various concentrations of copper ions, hydrogen peroxide, sulfate ions, chloride ions, additives and solution pH values. The root causes of explosion of waste ECP chemicals drum tank were identified by integration of this research results, process recipes and hardware configuration. Experimental results demonstrated that the heat generation rate was decreased in more acidic solution conditions which repressed the generation of Cu2+(HO2-) ions at CuSO4/H2O2 system. The concentrations of Cu2+(HO2-) ion could be enhanced by the addition of chloride ions. And cuprous ions might not just react with hydroxyl free radical but partly react with hydrogen peroxide to generate heat source which resulted from hydroxyl free radical was partly scavenged by chloride ions. Consequently, the TMR (Time to Maximum Rate) was found to be decreased significantly with increasing chloride ion concentrations at CuSO4/H2O2/Chloride system. The heat generation rate in lower concentration of citrate ions was larger than that without the chelating agent additions. These might be because hydroxyl free radical was scavenged by organic species like as citrate ions, and then changed the parts of reaction ways of cuprous ion at CuSO4/H2O2/citrate system. The TMR at CuSO4/H2O2/citrate system was lower than that at CuSO4/H2O2/EDTA system due to copper-EDTA complex ion with higher stability constant to reduce the concentrations of Cu2+(HO2-) ions. The behaviors of heat generation could be explained by introducing the concepts of species distribution and free radical reaction mechanisms in aqueous solution at CuSO4/H2O2/additive system.
author2 Kuen-Chyr Lee
author_facet Kuen-Chyr Lee
WangCheng-Shyan
王承賢
author WangCheng-Shyan
王承賢
spellingShingle WangCheng-Shyan
王承賢
Reactivity Research of Hydrogen Peroxide and Copper Ions at Electrochemical Plating Process
author_sort WangCheng-Shyan
title Reactivity Research of Hydrogen Peroxide and Copper Ions at Electrochemical Plating Process
title_short Reactivity Research of Hydrogen Peroxide and Copper Ions at Electrochemical Plating Process
title_full Reactivity Research of Hydrogen Peroxide and Copper Ions at Electrochemical Plating Process
title_fullStr Reactivity Research of Hydrogen Peroxide and Copper Ions at Electrochemical Plating Process
title_full_unstemmed Reactivity Research of Hydrogen Peroxide and Copper Ions at Electrochemical Plating Process
title_sort reactivity research of hydrogen peroxide and copper ions at electrochemical plating process
publishDate 2005
url http://ndltd.ncl.edu.tw/handle/31890527877610112312
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