| Summary: | 碩士 === 國立中央大學 === 光電科學研究所 === 93 === We research the influence and difference of ITO thin film coating with different coating system and coating condition. We found that coating with e-beam evaporation with IAD makes film denser, but the effect is not good as magnetron sputtering. Coating ITO thin film on PET with sputtering system and different coating parameter, we can get a bit set of parameter: Oxygen flow 3sccm, sputtering power 500w. With such coating parameter, we can have sample with average 80% transmittance at visible range and 5*10-4.Observing the samples coating by sputter with IAD and further plasma pre-treating or post-treating, we found that the average transmittance at IR range drops and refractive indices increases, indicating that the film become denser. However the extinction coefficient rises that may due to the increase of the defect.
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